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30-300 kV (S)TEM. Double aberration corrected microscope with a variable acceleration voltage (30, 80 and 300 kV), enabling high-resolution imaging up to 50 pm both in TEM and STEM imaging mode. Equipped with energy dispersive X-ray spectrometry (EDX) for chemical mapping, and ultra-high-resolution electron energy loss spectrometry (UHR-EELS) enabled by its double monochromator and Gatan Continuum filter. It also has a direct-direction Gatan K3 IS camera allowing imaging of soft and beam-sensitive materials.

200 kV cryo-TEM equipped with a Gatan K2 direct-detection camera. This microscope is dedicated to high-resolution imaging and electron tomography under cryo conditions, for 3D reconstructions of cells and protein complexes.

200 kV (S)TEM for near-atomic imaging and characterization of materials science samples. High-brightness X-FEG electron gun, high-resolution imaging up tot 1.1 Ã…, electron diffraction, electron tomography, and high-sensitivity EDX chemical mapping.

120 kV (S)TEM for imaging of both life sciences and materials science specimens. Equipped with a cryo-box enabling prolonged cryo-EM inspections.

Basic TEM for training purposes and screening of samples.

5-30 kV FIB-SEM for high-resolution imaging of surfaces, compositional and structural analysis, and slice-and-view 3D reconstructions. Equipped with EBSD, CL, and EDX mapping capabilities, and a cryo specimen stage. The focussed ion beam (FIB) allows removing material so that cross-sectional imaging perpendicular to the surface is possible, as well as extracting FIB-made lammellae that can be subsequently inspected in a TEM microscope.